RIE/ICP/DSE Plasma Therm – Advanced Vacuum

Plasma Etch and Thin Film for RIE/ICP/DSE Systems

Reactive Ion Etching (RIE) complete systems,  Inductively Coupled Plasma (ICP) and Deep Silicon Etch (DSE)  by Plasma Therm and Advanced Vacuum, a Plasma-Therm company.

VERSALINE RIE

Reactive Ion Etching (RIE) Systems from Plasma Therm

Plasma-Therm’s VERSALINE RIE systems are installed in a wide range of production capacity facilities – from R&D through high-volume production. VERSALINE RIE offers low maintenance and high versatility for multiple applications.

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VERSALINE ICP

Inductively Coupled Plasma (ICP) Systems from Plasma Therm

Plasma-Therm’s VERSALINE ICP is the product resulting from decades of technological evolution. Well-known and accepted product lines including the 790, Shuttlelock, and Versalock all played a role in the development of the VERSALINE ICP.

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VERSALINE DSE

Deep Silicon Etch (DSE) from Plasma Therm

Plasma-Therm’s VERSALINE DSE provides profile control and side wall smoothness while utilizing award-winning fast process control.

Outstanding flexibility and process latitude are offered as well as the highest selectivities to mask material in the industry.

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VISION RIE 320

Reactive Ion Etching (RIE) System from Advanced Vacuum

Advanced Vacuum’s Vision 320 RIE (Reactive Ion Etch) provides etch capability for R&D, prototyping, and low volume production.

This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering.

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VISION RIE 420

Reactive Ion Etching (RIE) System from Advanced Vacuum

The VISION 420 RIE (Reactive Ion Etch) provides etching capabilities over a variety of materials and substrates for non-caustic etching (primarily Fluorine based). The small footprint, low cost, ease of use and superior performance makes the Vision 420 an ideal candidate for a wide range of uniform, high quality films serving R&D, prototyping, pilot line and low volume production.

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APEX SLR ICP

Inductively Coupled Plasma (ICP) System from Advanced Vacuum

The Apex SLR is a continuation of Plasma-Therm’s highly regarded Shuttlelock® system in a compact, robust and easily maintained form factor. The small footprint, low cost, ease of use and superior performance makes the Apex SLR ideal for a wide range of uniform, high quality ICP etch applications serving R&D, FA, prototyping, pilot line and low volume production.

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