AIMS™ – 1x-193i

Next Generation AIMS™ System Convinces with Completely New Optical Design

IMS™ 1x-193i supports the further extension of 193nm lithography and meets the challenging requirements of advanced lithography techniques such as Multi-Patterning and Source Mask Optimization.

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ZCI6ImNzcEZvcm1TaGVsbF8xMDZfNzY5NDkyIiwiY29ubmVjdF9oYXNoIjoiNDllMzljZDg4YzJjYjA2ZTFkY2M3M2MyMzVjOTdmMzQifQ==

AIMS™ – AutoAnalysis Software

Verification of EUV masks

Verification of EUV masks.

The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required, AIMS™ EUV.

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MeRiT neXT – Zeiss

A Paradigm Shift in Classical Mask Repair

The new ZEISS MeRiT neXT system enables the repair of smallest next generation defects. With its ZEISS low energy ebeam column the tool represents a paradigm shift in classical photomask repair.

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cEZvcm1TaGVsbF8xMDhfNDk5Nzk3IiwiY29ubmVjdF9oYXNoIjoiNjNjMzc2ZGUwNDhiYzVlZWFkNDNhYjhmMDhiNGMzNDQifQ==