RIE/ICP/DSE Plasma Therm – Advanced Vacuum

Sistemi RIE/ICP/DSE per Attacchi al Plasma di Film Sottili

Sistemi completi di tipo Reactive Ion Etching (RIE), Inductively Coupled Plasma (ICP) e Deep Silicon Etch (DSE) per attacchi al plasma di film sottili prodotti da Plasma Therm e dalla società controllata Advanced Vacuum.

VERSALINE RIE

Attacco Reactive Ion Etching (RIE) per etching di Plasma Therm

I sistemi VERSALINE RIE di Plasma-Therm, che sfruttano una configurazione a parallel plate con l’elettrodo substrato RF polarizzato, sono installati in un grande numero di facilities di produzione  e vengono utilizzati  dalla ricerca e sviluppo fino alla produzione di grandi volumi.

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VERSALINE ICP

Attacco Inductively Coupled Plasma (ICP) per etching di Plasma Therm

Il sistema Plasma THERM VERSALINE ICP è il prodotto risultante da decenni di evoluzione tecnologica.

Prodotti ben riconosciuti ed accetta come la serie 790, Shuttlelock, e Versalock hanno giocato un ruolo nello sviluppo del VERSALINE ICP.

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bF81NF82MzQ0NTQiLCJjb25uZWN0X2hhc2giOiJjNTU5Yjg3Njk0NWUzMDg0NTE3OGZkMzlmOTA4ZmU0NCJ9

VERSALINE DSE

Attacco Deep Silicon Etch (DSE) di Plasma Therm con processi di etching e deposizione

VERSALINE DSE è una modalità speciale di ICP che combina processi di etching e deposizione, in successione temporale permettendo la produzione di strutture profonde con pareti verticali su silicio e SOI.

VERSALINE DSE Fornisce un controllo del profilo e della levigatezza delle pareti verticali utilizzando un rapido controllo.

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bF81NV82NzIxNTgiLCJjb25uZWN0X2hhc2giOiI1OWQzZjgzMTNjMWFlOGM3NjRmZTgzYzc0ZDI0ZWJjMiJ9

VISION RIE 320

Attacco Reactive Ion Etching (RIE) per etching di Advanced Vacuum

Il Sistema  VISION RIE 320 Advanced Vacuum viene utilizzato per attività di R&D, prototipazione, e produzione di piccoli volumi.

Il sistema capacitivo a parallel-plate trova applicazioni in studi fondamentali della material, modifiche superficiali, fabbricazione di dispositivi a semiconduttore e failure analisys incluso il delayering.

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VISION RIE 420

Attacco Reactive Ion Etching (RIE) per etching di Advanced Vacuum

Il Sistema  VISION RIE 420 Advanced Vacuum permette di attaccare una grande varietà di materiali e substrati per etching non caustico (basato sulla chimica del Fluoro).

Il ridotto ingombro, il basso costo, la facilità di utilizzo e le performance superiori rendono il Vision 420 il candidato ideale per attacchi uniformi R&D, prototipazione, e produzione di piccoli volumi in numerosi applicazioni come LED, MEMs e sistemi wireless.

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bGxfNTdfNDYzODkxIiwiY29ubmVjdF9oYXNoIjoiMzdiMTFjODlhMThjYWVkZTIyYjM1MTVlZGM3MzY1MjkifQ==

APEX SLR ICP

Attacco Inductively Coupled Plasma (ICP) per etching di Advanced Vacuum

Il Sistema ICP Apex SLR Advanced Vacuum è basato sulla piattaforma consolidata Plasma-Therm’s Shuttlelock® con un ingombro ridotto. L’affidabilità del hardware, la facilità di utilizzo, ed il costo contenuto lo rendono ideale per applicazioni quali, high quality ICP etch, R&D, FA, prototipazione, linee pilota e produzione di piccoli volumi.

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XzU4XzM5NzAzMiIsImNvbm5lY3RfaGFzaCI6ImViOTZjNGVlZDBlMTA4ODM0MWU4ZjZlZjYxMWVkZmNiIn0=

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